Application of Quantum Cascade Laser Absorption Spectroscopy for Correlation Studies in Plasma Etching Processes in the Semiconductor Industry 
Date: Mar 26, 2018
Applying quantum cascade laser absorption spectroscopy a correlation could be demonstrated between the concentration of the etching products SiF4 and CO and the etching rate of ultra-low-k SiCOH in a low-pressure rf plasma containing CF4.